[17p-M_103-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[17p-M_103-9] Effects of TMS Gas Flow Rates on Change Si Content in Si-DLC Films Prepared by GIPP-CVD Method introducing different TMS Gas Flow rate

〇Seigo Makida¹, Toru Harigai¹, Taketo Nagai¹, Hiroyuki Kosaka¹ (1.Gifu Univ)

Keywords:

plasama