Presentation Information
[17p-PB3-12]Analysis of ionization-ratio characteristics of sputtered particles produced in multi-pulse sputtering by plasma optical emission spectroscopy
〇Eisuke Yokoyama1,2, Yuki Nakagawa2, Hiroki Kobayashi2, Masaomi Sanekata2, Masahide Tona3, Hiroaki Yamamoto3, Keizo Tsukamoto3, Kiyokazu Fuke4, Keijiro Ohshimo5, Fuminori Misaizu6 (1.Salesian Polytech., 2.Tokyo Polytech. Univ., 3.Ayabo Corp., 4.Kobe Univ., 5.Hokkaido Univ. of Edu., 6.Tohoku Univ.)
Keywords:
High Power Impulse Magnetron Sputtering,Optical emission spectroscopy,Ionization ratio
In recent years, high-power pulsed magnetron sputtering (HPPMS) has evolved into multi-pulse processes aimed at improving the deposition rate and film quality. Representative examples include multi-pulse HiPIMS (m-HiPIMS) which consists of several pulses, and deep oscillation magnetron sputtering (DOMS) which consists of several dozen pulses. In this study, we designed sputtering waveforms with one to several control pulses and carried out sputtering by applying these pulses to a Ti target in an Ar atmosphere. Time-resolved measurements of the generated plasma were performed using optical emission spectroscopy (OES) to investigate the effect of pulse multiplexing on the ionization ratio of sputtered particles.