Presentation Information
[17p-W2_401-6]Quantum injection crossover in ultra-degenerate GaN/metal interfaces
〇Kohei Ueno1, Kohei Okabe1, Aiko Naito1, Hiroshi Fujioka1 (1.IIS, UTokyo)
Keywords:
contact resistivity,GaN
Conventional metal/semiconductor contacts have been described by TFE/FE models, which predict intrinsically high contact resistivity for wide-bandgap semiconductors due to unfavorable tunneling parameters. We demonstrated an extremely low contact resistivity of 5.8×10-9 Ωcm² on heavily Ge-doped GaN (n = 4×1020 cm-3), approaching within one order of the Landauer quantum injection limit and comparable to InAs/InGaAs despite very different material properties. By re-plotting ρC as a function of the normalized tunneling parameter E00/kBT, we found that while wide-gap materials show higher resistivity in the TFE/FE transition region, GaN reaches a high-E00/kBT regime where a plateau appears. This suggests a transition of the limiting mechanism from depletion-layer tunneling to a quantum injection limit at the metal/semiconductor interface.
