[17p-W2_401-1~17] 15.4 III-V-group nitride crystals

3:45 PM - 4:00 PM JST(6:45 AM - 7:00 AM UTC)

[17p-W2_401-8] Influence of Graphene/SiC(0001) Substrate Surface Morphology on the Crystallinity of Nitride Thin Films

〇Hodaka Hamamoto¹, Keisuke Takemoto¹, Yusuke Zushi¹, Kohei Ueno², Hiroshi Fujioka² (1.Nissan Motor Co., 2.Univ. of Tokyo)

Keywords:

pulsed sputtering deposition,2D material,nitride thin films