Presentation Information
[18a-PA3-11]Simultaneous Frequency–Dissipation QCM Analysis of Amorphous TiOxThin-Film Formation by Ti(acac)2(OiPr)2-Based Mist CVD
〇Hajime Shirai1,2, Fumiya Kobayashi2, Hideki Kurihara3, Yoshiaki Yamamoto4, Haiyan He4, Hirotaka Sone1, Tomomasa Sato2, Nobuyuki Matsuki2, Toshinori Oono4 (1.Saitama Univ., 2.Kanagawa Univ., 3.SAITEC, 4.Amaya Co., Ltd)
Keywords:
mist-CVD,Surface reaction of a-TiOx growth,Real time monitoring using QCM
In anode-free metal batteries and next-genertion lithiu-ion batteryies, the active control of lithium iond through interfacial layer design has become a critical challenge. Amophous titanium oxide is a promising candidate for a lithium ion diffusion control layer owing to its high dielectri constnst and amophos struture. However, the initial growth process during film deposition has rarely been invetigated. In this paper, we discuss the real-time monitoring of the a-TiOx growth with varied substrate temperature, type of solvent, substrate, and substrate bias using micro-balance technique.