Presentation Information
[18a-PB4-10]Evaluation of surface damage on plasma-irradiated semiconductor substrates using a light scattering wafer surface inspection device
〇(M1)Yuya Yamamoto1, Kazunobu Asakawa2, Kunio Fukatsu2, Youhei Otani3, Tetsuya Sato1 (1.Yamanashi Univ., 2.YGK Co., Ltd., 3.Suwa Univ. of Sci)
Keywords:
Particle Scanner,GeO2,defect