The 73rd JSAP Spring Meeting 2026
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Session Details

Poster presentation8 Plasma Electronics : 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-PB4-1~12]8.2 Plasma deposition of thin film, plasma etching and surface treatment

Wed. Mar 18, 2026 11:30 AM - 1:00 PM JST
Wed. Mar 18, 2026 2:30 AM - 4:00 AM UTC
PB4 (Martial Arts Hall (B1F))

[18a-PB4-1]Study on powder properties changes during thin film fabrication using powder targets

〇Hiroharu Kawasaki1, Takahiko Satake1,2, Akihiro Ikeda2, Shinichi Aoqui2, Masaaki Yamazato3, Tamiko Ohshima4 (1.Nat,l Ins. Tech., Sasebo Col., 2.Sojo Univ., 3.RyuKyu Univ., 4.Nagasaki Univ.)

[18a-PB4-2]Room temperature deposition of crystalline SnS thin film on PET film by reactive sputtering using sulfur plasma

〇Daiki Daiki Motai1, Issei Suzuki1, Takahisa Omata1 (1.Tohoku Univ.)

[18a-PB4-3]Development of a HiPIMS Plasma Model incorporating Particle Transport from the Ionization Region

〇Motoki Abe1, Takayuki Ohta2, Akinori Oda1 (1.Chiba Tech, 2.Meijo Univ.)

[18a-PB4-4]Effect of Gas Flow Ratio on Basic Characteristics of He/CO Plasmas for Hydrogen-Free DLC films Deposition

〇(M2)Tatsuya Takiguchi1, Toru Harigai2, Hiroyuki Kousaka2, Akinori Oda1 (1.Chiba Tech., 2.Gifu Univ.)

[18a-PB4-5]Formation of SiC on Si Substrates via Hydrogen-Methane Microwave Plasma Irradiation and NEXAFS Analysis

〇(B)Souta Muroya1, Hiroki Kitahara1, Daichi Ogura1, Tetsuya Sato1, Shin-ichi Motoyama2 (1.Univ. of Yamanashi, 2.Miyatsu Co., LTD)

[18a-PB4-6]Tuning a-C:H Film Density and Stress via Substrate Bias Voltage and Total Gas Pressure in Cumene Plasma CVD

〇Shinjiro Ono1, Manato Eri1, Shumpei Ohara1, Takamasa Okumura1, Kunihiro Kamataki1, Kazunori Koga1, Masaharu Shiratani1 (1.Kyushu Univ.)

[18a-PB4-7]Synthesis of carbon-based thin film using slot antenna method by liquid plasma CVD

〇Kaito Hashiguchi1, Tatsuo Ishijima1, Yusuke Nakano1, Yasunori Tanaka1 (1.Kanazawa Univ.)

[18a-PB4-8]Relationship between Plasma Parameters and Film Properties in Ar/He/C2H2 PECVD

〇Kazuki Nagamine1,2, Yushi Sato1, Kunihiro Kamataki1, Masaharu Shiratani1 (1.ISEE, Kyushu Univ., 2.JGMI, Kyushu Univ.)

[18a-PB4-9]Effect of Dielectric Nozzle Diameter on Electric Field Distribution and Plasma Generation Characteristics in a Microwave Atmospheric Pressure Plasma Jet

〇Hiroki Nagamori1, Bat-Orgil Erdenezaya1, Tatsuo Ishijima1, Yusuke Nakano1, Yasunori Tanaka1 (1.Kanazawa Univ.)

[18a-PB4-10]Evaluation of surface damage on plasma-irradiated semiconductor substrates using a light scattering wafer surface inspection device

〇(M1)Yuya Yamamoto1, Kazunobu Asakawa2, Kunio Fukatsu2, Youhei Otani3, Tetsuya Sato1 (1.Yamanashi Univ., 2.YGK Co., Ltd., 3.Suwa Univ. of Sci)

[18a-PB4-11]In-situ Surface Reaction Analysis of Hydrogen Radical Irradiation Effects on Residual Chlorine after Thermal-Cyclic Atomic Layer Etching of Titanium Nitride Using Chlorine Radicals.

〇(M2)Shunya Hirai1, Kazunori Shinoda2, Thi-Thuy-Nga Nguyen1, Takayoshi Tsutsumi1, Kenichi Inoue1, Kenji Ishikawa1 (1.Nagoya Univ., 2.Hitachi High-Tech Corp.)

[18a-PB4-12]Evaluation of the Application of a Microwave-Excited Water Vapor Plasma Ashing Process to Hybrid pMOSFET Fabrication

〇Hiroki Taniguchi1,2, Tatsuo Ishijima1,2, Yusuke Nakano1,2, Yasunori Tanaka1,2 (1.Kanazawa Univ., 2.EPEL)
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