[18a-PB4-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-PB4-6] Tuning a-C:H Film Density and Stress via Substrate Bias Voltage and Total Gas Pressure in Cumene Plasma CVD

〇Shinjiro Ono¹, Manato Eri¹, Shumpei Ohara¹, Takamasa Okumura¹, Kunihiro Kamataki¹, Kazunori Koga¹, Masaharu Shiratani¹ (1.Kyushu Univ.)

Keywords:

plasma CVD,cumene,bias voltage control