[18a-PB4-1~12] 8.2 Plasma deposition of thin film, plasma etching and surface treatment

[18a-PB4-8] Relationship between Plasma Parameters and Film Properties in Ar/He/C₂H₂ PECVD

〇Kazuki Nagamine^1,2, Yushi Sato¹, Kunihiro Kamataki¹, Masaharu Shiratani¹ (1.ISEE, Kyushu Univ., 2.JGMI, Kyushu Univ.)

Keywords:

PECVD,amorphous carbon,plasma parameter