Presentation Information
[18p-M_103-5]Energy-resolved time-evolution measurement using time-of-flight mass spectrometry in the deposition region of high-power pulsed magnetron sputtering
〇Hiroki Kobayashi1, Naon Kamimura1, Masato Miyata1, Yuki Nakagawa1, Eisuke Yokoyama1,2, Masaomi Sanekata1, Masahide Tona3, Hiroaki Yamamoto3, Keizo Tsukamoto3, Kiyokazu Fuke4, Keijiro Ohshimo5, Fuminori Misaizu6 (1.Tokyo Polytech Univ., 2.Salesian Polytech., 3.Ayabo Corp., 4.Kobe Univ., 5.Hokkaido Univ. of Edu., 6.Tohoku Univ.)
Keywords:
Time-of-flight mass spectrometer,High power pulsed magnetron sputtering,Energy distribution function
High power pulsed magnetron sputtering (HPPMS), multi-pulse high power impulse magnetron sputtering (m-HiPIMS), particularly which enables an improvement in deposition rate while maintaining a high ionization ratio, has recently attracted considerable attention as an advanced deposition technique.
On the other hand, deep oscillation magnetron sputtering (DOMS) allows discharge with several tens of consecutive pulses due to trade-offs for the operation with a relatively lower power density than m-HiPIMS, resulting in the excellent arc-free operation and enabling the stable formation of a-few-ms pulsed plasma.
In this study, properties of m-HiPIMS and DOMS were investigated in time-resolved measurements and energy distribution analyses of ions generated by each sputtering technique , using time-of-flight mass spectrometry (TOF-MS).
On the other hand, deep oscillation magnetron sputtering (DOMS) allows discharge with several tens of consecutive pulses due to trade-offs for the operation with a relatively lower power density than m-HiPIMS, resulting in the excellent arc-free operation and enabling the stable formation of a-few-ms pulsed plasma.
In this study, properties of m-HiPIMS and DOMS were investigated in time-resolved measurements and energy distribution analyses of ions generated by each sputtering technique , using time-of-flight mass spectrometry (TOF-MS).