[1P01-32] Poster session

[1P25] Numerical analysis of the influence of plasma properties on film hardness in diamond-like carbon deposition using HiPIMS

*Motoki Abe¹, Takayuki Ohta², Akinori Oda¹ (1. Chiba Institute of Technology (Japan), 2. Meijo University (Japan))

High-Power Impulse Magnetron Sputtering (HiPIMS) has attracted considerable attention as an effective technique for depositing hard diamond-like carbon (DLC) films because it enables high ionization of sputtered species at low temperatures. However, the correlation between DLC film hardness and plasma characteristics remains unclear due to the difficulty of experimental diagnostics. In this study, a coupled model comprising an ionization-region model and a particle-transport model was used to analyze DLC deposition experiments. The relationship between experimentally obtained DLC film hardness and various plasma parameters was then examined. As a result, the increase in film hardness with increasing applied voltage was consistent with an increase in the average incident energy of C⁺ ions, suggesting that C⁺ ion bombardment contributes to increased film hardness.

Password required to view