Presentation Information
[2C03]PEEM Study on Work Function Modulation in Graphene on SiO2 Substrates by Energy-Controlled Ar Plasma
*Akito Fukuda1, Tadashi Abukawa1,2, Susumu Takabayashi3 (1. Institute of Multidisciplinary Research for Advanced Materials, Tohoku University (Japan), 2. International Center for Synchrotron Radiation Innovation Smart, Tohoku University (Japan), 3. National Institute of Technology, Ariake College (Japan))
Controlling the electronic states is essential for the application of single-layer graphene devices with excellent properties. In this study, we controlled the structure of graphene using an energy-controllable photoelectron-controlled plasma and evaluated its effect on the work function through local secondary electron spectroscopy using PEEM. As a result, we observed a decrease in the work function of approximately 0.3–0.4 eV in the treated region compared to the untreated region. This can be explained by the relaxation of surface dipoles associated with p-type doping and is consistent with previous XPS results.
Password required to view
Comment
To browse or post comments, you must log in.Log in