Presentation Information
[2D14]Correlating TiO2 electronic structure with band Alignment in Mo:BiVO4/TiO2 oxide heterojunctions
*Lingga Ghufira Oktariza1,2, Kenichi Ozawa1,2, Kazuhiko Mase1,2, Takeaki Sakurai3 (1. Institute of Materials Structure Science, High Energy Accelerator Research Organization (KEK) (Japan), 2. Graduate University of Advanced Studies (SOKENDAI) (Japan), 3. Institute of Pure and Applied Sciences, University of Tsukuba (Japan))
Band alignment at oxide heterointerfaces plays a key role in charge transport and carrier separation, yet its relationship with the electronic structure of TiO2 remains insufficiently understood. This study investigates the effect of oxygen partial pressure during RF sputtering on the electronic structure of TiO2 and its correlation with band alignment in Mo:BiVO4/TiO2 oxide heterojunctions. Ultraviolet photoelectron spectroscopy revealed systematic changes in the work function and valence-band maximum with increasing oxygen partial pressure, indicating suppression of donor-like electronic states in oxygen-deficient TiO2. These electronic structure changes reduced the Fermi-level mismatch, leading to improved band alignment, a lower onset potential, and enhanced photoelectrochemical performance. This work establishes a direct correlation between UPS-derived electronic structure and heterojunction band alignment, providing a surface-science perspective for rational oxide heterointerface design.
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