[M-5] Advanced Materials and Thin Films

9:30 AM - 9:45 AM JST(12:30 AM - 12:45 AM UTC)

[M-5-03] Crystalline Phase Transition of Ultra-thin Ni-silicide Film during SiH₄ Exposure

〇Shun Tanida¹, Noriyuki Taoka², Katsunori Makihara¹ (1. Nagoya Univ. (Japan), 2. Aichi Inst. of tech. (Japan))

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