Presentation Information
[PS-10-12]Investigation of HfO2/ZrO2 Superlattice Gate Stack for Scaling
〇TZU-I KAO1, Kai-Wei Huang1, Yi-Wen Lin1, Jun-Wei Wu2, Yung-Chun Wu1,2, Fu Ju Hou3 (1. Dept. of Engineering and System Science, National Tsing Hua Univ (Taiwan), 2. College of Semiconductor Research, National Tsing Hua Univ., (Taiwan), 3. Taiwan Semiconductor Research Institute (Taiwan))