[SO-PS-01] 01: Advanced CMOS: Material Science / Process Engineering / Device Technology

1:56 PM - 1:58 PM JST(4:56 AM - 4:58 AM UTC)

[SO-PS-01-14] AR-HAXPES Evaluation of the Effect of Hydrogen Plasma Treatment on the Chemical Bonding State and Distribution of Hydrogen in SiN Films

〇Yoshiharu Kirihara¹, Haruto Omata¹, Akira Yasui², Kiyokazu Nakagawa³, Yuichiro Mitani¹, Hiroshi Nohira¹ (1. Tokyo City Univ. (Japan), 2. JASRI (Japan), 3. Abit Technologies (Co. Ltd.) (Japan))

Password required to view