Presentation Information
[E-5-03]Dielectric Dry Etch Patterning Used In Single Gate EUV Spin Qubit Device
〇Yuchao Jiang1, Sofie Beyne1, Chia-Yang Chou1, Stefan Kubicek1, Yannick Hermans1, Johan De Backer1, Clement Godfrin1, Jeongsoo Kim1, Danny Wan1, Kristiaan De Greve1, Katia Devriendt1 (1. IMEC (Belgium))