[H-3] Wide Bandgap and Oxide Materials II

9:00 AM - 9:15 AM JST(12:00 AM - 12:15 AM UTC)

[H-3-01] Growth of High-Quality AlN Templates by Metalorganic Vapor Phase Epitaxy on Sputtered AlN

〇Yuto Matsubara¹, Koki Fujii¹, Yusuke Takayanagi¹, Yukiya Hayashi¹, Yuusuke Takashima^1,2, Yoshiki Naoi^1,2, Atsushi Maeoka³, Atsushi Osawa³, Shigeru Takatsuji³, Takahiro Kimura³, Kentaro Nagamatsu^1,2 (1. Tokushima University (Japan), 2. Institute of Post-LED Photonics, Tokushima University (Japan), 3. SCREEN Holdings Co. Ltd. (Japan))