Presentation Information
[PS-01-10 (Late News)]Hf/Zr Ratio Adjusting in HfxZr1-xO2 and Conducting Structural Engineering for Capacitor with High Capacitance Density and Low Leakage Current
〇Hong-Yan Zhu1, Yu-Chun Li1, Zi-Ying Huang1, Hao-Lin Liao1, Wei-Min Li2, David Wei Zhang Zhang1, Hong-Liang Lu1 (1. Fudan University (China), 2. Jiangsu Leadmicro Nano Technol Co Ltd (China))