Presentation Information
[PS-02-29]Improvement of Polarization, Cycle Endurance and Switching Speed under Low- voltage Operation in 3.5nm HfO2/ZrO2 Ferroelectric Capacitors by Remote H2/O2 Plasma Treatment
〇Wei-Kuo Tseng1, Y.-T. Tang1 (1. Dept. of Electrical Engineering, National Central Univ. (Taiwan))