Presentation Information
[PS-04-07]Orientation Dependence of Structural Stability and Band Alignment for N-incorporated 4H-SiC/SiO2 Interfaces: A DFT-Based Approach
〇Naoto Ise1, Toru Akiyama1, Tetsuo Hatakeyama2, Kenji Shiraishi3, Takashi Nakayama4 (1. Mie University (Japan), 2. Toyama Prefectural University (Japan), 3. Tohoku University (Japan), 4. Chiba University (Japan))