Presentation Information
[PS-08-09]Crystallinity Improvement for PVD-MoS2 Films by Plasma Damage Reduction with Higher Deposition Pressure
〇Naoki Matsunaga1, Jaehyo Jang1, Soma Ito1, Kuniyuki Kakushima1, Hitoshi Wakabayashi1 (1. Institute of Science Tokyo (Japan))