Presentation Information
[PS-10-04]MOS Structure Based Characterization of NiO Thin Films Deposited by Oxygen-Controlled Magnetron Sputtering
〇Qiaoyu Hu1, Robert Sokolovskij2, Wenmao Li1, Wenchuan Tao1, Qing Wang1, Hongyu Yu1,2 (1. Southern Univ. of Sci. and Tech. (China), 2. Shenzhen Polytechnic Univ. (China))