[PS-10] 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

[PS-10-04] MOS Structure Based Characterization of NiO Thin Films Deposited by Oxygen-Controlled Magnetron Sputtering

〇Qiaoyu Hu¹, Robert Sokolovskij², Wenmao Li¹, Wenchuan Tao¹, Qing Wang¹, Hongyu Yu^1,2 (1. Southern Univ. of Sci. and Tech. (China), 2. Shenzhen Polytechnic Univ. (China))

DOI:

https://doi.org/10.7567/SSDM.2025.PS-10-04

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