[H-7] Advanced Materials and Thin Films | 2025 International Conference on Solid State Devices and Materials

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Session Details

Oral Presentation11: Advanced Materials: Synthesis / Crystal Growth / Characterization

[H-7]Advanced Materials and Thin Films

Thu. Sep 18, 2025 1:30 PM - 2:45 PM JST
Thu. Sep 18, 2025 4:30 AM - 5:45 AM UTC

Room H (314, 3rd Floor)

Session Chair: Kentaro Watanabe (Shinshu Univ.), Tomohiro Yamaguchi (Kogakuin Univ.)

1:30 PM - 1:45 PM JST(4:30 AM - 4:45 AM UTC)

[H-7-01]Impact of post-growth treatments on electrical insulation of chemical bath-grown ZnO nanowires and their underlying mechanisms

〇Kazuki Yamanaka¹, Kentaro Watanabe^1,2 (1. Shinshu Univ. (Japan), 2. IFES, Shinshu Univ. (Japan))

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[H-7-02]Structural and Photoluminescence Properties of Cs₂PtCl₆-Based Structures Synthesized using Cs-Containing Aqueous Solution

Katsuki Tanaka¹, Ryo Tamaki², Kanji Hara¹, Kotaro Yamakawa¹, Tatsuya Watanabe¹, Yoshitaka Okada³, Shinji Tsuyumu⁴, 〇Hirokazu Tatsuoka¹ (1. Shizuoka Univ. (Japan), 2. Keio Univ. (Japan), 3. The Univ. of Tokyo (Japan), 4. Eu-BS Co.,Ltd. (Japan))

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

[H-7-03]Thickness dependence below 10 nm on the ferroelectric HfN_1.15thin film formation by ECR-plasma sputtering

〇KANGBAI LI¹, Shun-ichiro Ohmi¹ (1. Science Tokyo (Japan))

2:15 PM - 2:30 PM JST(5:15 AM - 5:30 AM UTC)

[H-7-04]Synthesis and Magnetism of Two-Dimensional CrS₂ Film

〇Yuwei Wang^1,2, Jiwei Liu^1,2, Shuo Xiong^1,2, Mingsheng Xu^1,2 (1. The Univ. of Zhejiang (China), 2. The Sate Key Lab. of Silicon and Advanced Semiconductor Materials (China))

2:30 PM - 2:45 PM JST(5:30 AM - 5:45 AM UTC)

[H-7-05]Fabrication and characterization of ferromagnetic metal pattern embedded structure in Si-doped GaAs

〇Yuichiro Masubuchi¹, Shintaro Ohta¹, Tomoaki Takemura¹, Hayato Miyagawa¹ (1. Kagawa University (Japan))

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