Session Details
[SC2]State-of-the-arts ULSI technologies: Materials, Processes, Devices, and Integration
Mon. Sep 15, 2025 12:55 PM - 4:45 PM JST
Mon. Sep 15, 2025 3:55 AM - 7:45 AM UTC
Mon. Sep 15, 2025 3:55 AM - 7:45 AM UTC
312 & 311, 3rd Floor
Organizer: Osamu Nakatsuka (Nagoya Univ.)
[SC2-OP]Opening Remarks
[SC2-01]The Future of CMOS: Facing the Limits of Scaling with the Promise of 2D Materials
〇Devin Verreck1 (1. imec)
[SC2-02]TBD
〇Koji Nii1 (1. TSMC)
[SC2-03]Next-Generation Memory Devices: 3D and Beyond-3D Integration, Applications to New Fields, and Sustainability
〇Tomoya Sanuki1 (1. KIOXIA)
[SC2-Break]Break
[SC2-04]Beyond Transistor Scaling: Maximizing Chip Utilization and Connectivity with Wafer Bonding Technologies
〇Tetsu Ohtou1 (1. TEL)
[SC2-05]Engineering the Interface: Metal/Semiconductor Contact Technology from Si-FETs to the More-Than-Moore Era
〇Philippe Rodriguez1 (1. CEA-Leti)
[SC2-06]Chiplet Integration Technology
〇Yoichiro Kurita1 (1. Science Tokyo)