Session Details

[SC2]State-of-the-arts ULSI technologies: Materials, Processes, Devices, and Integration

Mon. Sep 15, 2025 12:55 PM - 4:45 PM JST
Mon. Sep 15, 2025 3:55 AM - 7:45 AM UTC
312 & 311, 3rd Floor
Organizer: Osamu Nakatsuka (Nagoya Univ.)

[SC2-OP]Opening Remarks

[SC2-01]The Future of CMOS: Facing the Limits of Scaling with the Promise of 2D Materials

〇Devin Verreck1 (1. imec)

[SC2-02]TBD

〇Koji Nii1 (1. TSMC)

[SC2-03]Next-Generation Memory Devices: 3D and Beyond-3D Integration, Applications to New Fields, and Sustainability

〇Tomoya Sanuki1 (1. KIOXIA)

[SC2-Break]Break

[SC2-04]Beyond Transistor Scaling: Maximizing Chip Utilization and Connectivity with Wafer Bonding Technologies

〇Tetsu Ohtou1 (1. TEL)

[SC2-05]Engineering the Interface: Metal/Semiconductor Contact Technology from Si-FETs to the More-Than-Moore Era

〇Philippe Rodriguez1 (1. CEA-Leti)

[SC2-06]Chiplet Integration Technology

〇Yoichiro Kurita1 (1. Science Tokyo)