Presentation Information
[A-6-05]Innovative Contact Etch Stop Layer Allowing Performance and Robustness Improvement for Advanced FD-SOI Devices
〇Emmanuel PETITPREZ1, Pierre BRIANCEAU1, Blend MOHAMAD1, Zdenek CHALUPA1, Alexis KRAKOVINSKY1, Krunoslav ROMANJEK1, Jorge-Pablo NACENTA MENDIVIL1 (1. Univ. Grenoble Alpes, CEA-Leti (France))
