[A-7] Process for memory

12:45 PM - 1:00 PM JST(3:45 AM - 4:00 AM UTC)

[A-7-01] Relationship between Electrical Characteristics and Crystal Phases in High-k HfO2–ZrO2 Systems

〇Takamasa Kawanago^1,2, Takefumi Kamioka^1,2, Yukinori Morita^1,2, Naoya Okada^1,2, Kenzo Manabe^1,2, Wataru Mizubayashi^1,2, Hiroyuki Ota^1,2, Takashi Matsukawa^1,2, Shinji Migita^1,2 (1. National Institute of Advanced Industrial Science and Technology (AIST) (Japan), 2. LSTC (Japan))