Presentation Information

[B-4-04]Observation of polarization switching-induced carrier mobility degradation in MOSFETs utilizing ferroelectric and antiferroelectric-like Hf1-xZrxO2/Si gate stacks

〇Hiroyuki Matsukawa1, Mitsuru Takenaka1, Shinichi Takagi1,2, Kasidit Toprasertpong1 (1. The Univ. of Tokyo (Japan), 2. Teikyo Univ. (Japan))