Presentation Information
[B-8-02]Lanthanum Interlayer and Fluorine-Passivated HZO Co-Engineering for High-Memory-Window FeFETs with Suppressed Interface Traps from Room Temperature to 73K
〇Sangmyun Lim1, kyungsoo Park2, Sangkuk Han2, Jihoon Choi1, Taesuk Kim2, Hyunsoo Jung2, Changhwan Choi1,2 (1. Department of Semiconductor Engineering, Hanyang University (Korea), 2. Division of Materials Science & Engineering, Hanyang University (Korea))
