[H-1] Thermoelectric Devices and Materials

1:45 PM - 2:00 PM JST(4:45 AM - 5:00 AM UTC)

[H-1-02] Performance Enhancement of Multistage Silicon Micro Thermoelectric Devices Using Nickel Silicide Interconnects

〇Kaichi Takayama¹, Tatsuya Hayashi¹, Yusuke Kozuka^1,2, Makoto Kashiwagi¹, Takayoshi Shimura¹, Momoko Deura¹, Takayoshi Katase³, Piotr Pokryszka⁴, Karolina Laszczyk⁴, Takanobu Watanbe¹ (1. Waseda Univ. (Japan), 2. NIMS (Japan), 3. Inst. of Science Tokyo (Japan), 4. Wroclaw Univ. of Sci. and Tech. (Poland))

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