Presentation Information
[K-2-03]Extreme memory hole diameter shrinkage for High Aspect Ratio via patterning
〇Daniel Montero1, Senne Fransen1, Kruti Trivedi1, Igor Belov1, Mattia Pasquali1, Murat Pak1, Jeongsoo Kim1, Geert van den Bosch1, Christophe Lorant1, Maarten Rosmeulen1,2 (1. imec (Belgium), 2. KU Leuven (Belgium))