[K-2] Novel Materials and Advanced Process Technologies

4:30 PM - 4:45 PM JST(7:30 AM - 7:45 AM UTC)

[K-2-04] Atomic Layer Deposition of MoSi/Mo for Low-resistivity Contacts in Advanced Logic and DRAM Applications

Yuan Li¹, Sam Zhu², Yufeng Zhuang², Shuliang Lv², 〇Xun Gu² (1. Fudan Univ. (China), 2. AMEC (China))