Presentation Information

[SO-PS-02-15]Phase-Coexistence Engineering in FE-AFE HZO Bilayer MFM Capacitors for Improved Endurance, Imprint Stability, and Switching Nucleation

〇Tsz Ying Pun1, Cheng-Hung Wu2, Tsung-Ying Lin1, William Cheng-Yu Ma3, Vita Pi-Ho Hu2, Chun-Jung Su1,4 (1. Dept. Electrophysics, National Yang Ming Chiao Tung Univ. (Taiwan), 2. Graduate Inst. Electronics Engineering, National Taiwan Univ. (Taiwan), 3. Dept. Electrical Engineering, National Sun Yat-sen Univ. (Taiwan), 4. Taiwan Semiconductor Res. Inst., National Inst. of Applied Res. (Taiwan))