Presentation Information

[SO-PS-04-13]Contact Field Plate Length Engineering for Mitigating Hot-Carrier-Induced Drain Current Degradation in n-Type LDMOS Devices

〇JIA - QIU1, QIANWEN - GUO1, RAN - TAO1,2, DAWEI - GAO1,2, KAI - XU1,2, JUNKANG - LI1,2, RUI - ZHANG1,2 (1. Zhejiang Univ. (China), 2. ZJU-Hangzhou Global Sci. and Tech. Innovation Center (China))