[SO-PS-10] 10: Thin Film Electronics: Oxide / Non‐single Crystalline / Novel Process

1:54 PM - 1:56 PM JST(4:54 AM - 4:56 AM UTC)

[SO-PS-10-13] Cu Resistivity Reduction by Ta Surface Oxidation Control Based on In-situ XPS Analysis

〇Yukiaki Oono¹, Yousuke Machida¹, Kazuhiko Tonari¹, Kyouji Notaki², Mauo Sogou², Daisuke Sakai², Shuzo Fujimura^2,3 (1. ULVAC Inc. (Japan), 2. ULVAC-PHI Inc. (Japan), 3. Institute of Science Tokyo Univ. (Japan))