[15p-70A_101-1~13] 原子層プロセス（ALP：Atomic Layer Process）の解析技術と応用技術（３）

13:45 〜 14:00奨励賞エントリー英語発表

[15p-70A_101-2] Study of the desorption effect on the adsorption of Trimethylaluminum and water ALD

〇Yuxuan Wu¹, Noboru Sato¹, Atsuhiro Tsukune¹, Yukihiro Shimogaki¹ (1.Univ. Tokyo)

キーワード：

Atomic layer deposition、Quartz Crystal Microbalance、Physisorption

Atomic Layer Deposition (ALD) is primarily relying on surface saturation adsorption of the precursor gas. To achieve an ideal ALD process with these properties, it is crucial to achieve the saturation of chemisorption on the surface and minimize the effect of physisorption, especially at low temperatures, where physisorption of species is inevitable. We are using an in-situ Quartz Crystal Microbalance to explore the adsorption and desorption of Trimethylaluminum (TMA) for Al₂O₃ ALD with H₂O as the reactant at low temperatures. The advanced measuring technique could easily obtain the adsorption behavior of precursors and reactants in an accurate time-dependent manner, where kinetic information reveals that controlling the desorption process is crucial for ALD at low temperatures.