Presentation Information
[B1325-1vn-01]Development of Photosensitive Polyimide Enabling High-Aspect-Ratio Patterning for Thick-Film
○Hayato Narikiyo1, Sho Miyao1 (1.Toray Industries, Inc.)
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Keywords:
Photolithography,Photosensitive Material,Polyimide,Photoreaction,Patterning
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