[B1325-1vn] Award Presentations, Special Lectures

3:55 PM - 4:25 PM JST(6:55 AM - 7:25 AM UTC)JapaneseCSJ Award for Young Chemists in Technical Development

[B1325-1vn-01] Development of Photosensitive Polyimide Enabling High-Aspect-Ratio Patterning for Thick-Film

○Hayato Narikiyo¹, Sho Miyao¹ (1. Toray Industries, Inc.)

Keywords:

Photolithography,Photosensitive Material,Polyimide,Photoreaction,Patterning