[IS] IS2 Recent Trends and Future Perspectives of Semiconductor Materials | Year 2025 Autumn Annual Meeting of JIMM

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Session Details

International Session

[IS]IS2 Recent Trends and Future Perspectives of Semiconductor Materials

Fri. Sep 19, 2025 1:00 PM - 3:20 PM JST
Fri. Sep 19, 2025 4:00 AM - 6:20 AM UTC

Room A(Open Hall)

Chair:Fumitaro Ishikawa

※表示の講演時間には質疑応答時間も含みます。
（質疑応答時間5分、基調講演と招待講演は5～10分）

1:00 PM - 1:30 PM JST(4:00 AM - 4:30 AM UTC)

[IS2.5]Ferroelectric Materials for Memory and Neuromorphic Device Applications

*Changhwan Choi^1,2 (1. Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea, 2. Department of Semiconductor Engineering, Hanyang University, Seoul 04763, Korea)

Comment()

1:30 PM - 2:00 PM JST(4:30 AM - 5:00 AM UTC)

[IS2.6]Research on new transistor structures and materials in AIST toward 2 nm technology node and beyond

*Toshifumi Irisawa¹ (1. National Institute of Advanced Science and Technology)

Comment()

2:00 PM - 2:15 PM JST(5:00 AM - 5:15 AM UTC)

break

2:15 PM - 2:45 PM JST(5:15 AM - 5:45 AM UTC)

[IS2.7]Understanding Interesting Phenomena at the Joints of Electronic Products: Thermodynamic and Kinetic Driving Forces

*Sinn-wen Chen^1,2,3 (1. Department of Chemical Engineering, National Tsing Hua University, 2. College of Semiconductor Research, National Tsing Hua University, 3. Center of High Entropy Materials, National Tsing Hua University)

Comment()

2:45 PM - 3:15 PM JST(5:45 AM - 6:15 AM UTC)

[IS2.8]Machine Learning Technology in SiC Solution Growth Method

*Toru UJIHARA¹ (1. Nagoya Univ.)

Comment()

3:15 PM - 3:20 PM JST(6:15 AM - 6:20 AM UTC)

[Closing Remark]Closing Remark

Masao Tanabe¹ (1.Shibaura Inst. of Tech)

Comment()

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