セッション詳細
[IS]IS2 Recent Trends and Future Perspectives of Semiconductor Materials
2025年9月19日(金) 13:00 〜 15:20
A会場(工学部オープンホール)
座長:畑山 祥吾(産業技術総合研究所)、石川 史太郎(北海道大学)、田邉 匡生(芝浦工業大学)
※表示の講演時間には質疑応答時間も含みます。
（質疑応答時間5分、基調講演と招待講演は5～10分）
（質疑応答時間5分、基調講演と招待講演は5～10分）
[IS2.5]Ferroelectric Materials for Memory and Neuromorphic Device Applications
*Changhwan Choi1,2 (1. Division of Materials Science and Engineering, Hanyang University, Seoul 04763, Korea, 2. Department of Semiconductor Engineering, Hanyang University, Seoul 04763, Korea)
[IS2.6]Research on new transistor structures and materials in AIST toward 2 nm technology node and beyond
*Toshifumi Irisawa1 (1. National Institute of Advanced Science and Technology)
休憩
[IS2.7]Understanding Interesting Phenomena at the Joints of Electronic Products: Thermodynamic and Kinetic Driving Forces
*Sinn-wen Chen1,2,3 (1. Department of Chemical Engineering, National Tsing Hua University, 2. College of Semiconductor Research, National Tsing Hua University, 3. Center of High Entropy Materials, National Tsing Hua University)
[IS2.8]Machine Learning Technology in SiC Solution Growth Method
*Toru UJIHARA1 (1. Nagoya Univ.)