Session Details

[19p-A35-1~10]Crystallization and Applications of Thin Film Semiconductors

Thu. Sep 19, 2024 1:30 PM - 5:35 PM JST
Thu. Sep 19, 2024 4:30 AM - 8:35 AM UTC
A35 (TOKI MESSE 3F)
Tatsuya Okada(Univ. of the Ryukyus), Magari Yusaku(Hokkaido Univ.)

[19p-A35-1]Opening

〇Tatsuya Okada1, Yusaku Magari2 (1.Univ. Ryukyus, 2.RIES-Hokkaido Univ.)

[19p-A35-2]Growth of High-Quality Group IV and III-V Poly-Crystal Films on Insulator

Ryu Hashimoto1, Takashi Kajiwara1, Kenta Moto2, Keisuke Yamamoto2, 〇Taizoh Sadoh1 (1.Kyushu Univ., 2.Kyushu Univ. IGSES)

[19p-A35-3]Solid-phase crystallization of high-performance semiconductor thin films and their device applications

〇Kaoru Toko1 (1.Univ. of Tsukuba)

[19p-A35-4]Crystal growth of group IV semiconductor thin-films during ultra-rapid annealing and their application to device fabrication

〇Seiichiro Higashi1 (1.Hiroshima Univ.)

[19p-A35-5]Effect of hydrogen in a-Si:H film on excimer laser crystallization

〇Akira Heya1, Koji Sumitomo1, Naoto Matsuo1 (1.Univ. of Hyogo)

[19p-A35-7]Cutting-edge backplane technologies for OLED display

〇Masashi Tsubuku1, Hajime Watakabe1, Toshinari Sasaki1, Takaya Tamaru1, Marina Mochizuki1 (1.Japan Display Inc.)

[19p-A35-8]Highly Reliable Bottom Gate Poly-InOx:H Thin-Film Transistor

〇Naoki Okamoto1, Xiaoqian Wang1, Mamoru Furuta1 (1.Kochi Univ. of Tech.)

[19p-A35-9]Highly Reliable Self-Aligned Top-Gate Thin-Film Transistors with Hydrogen-Doped Poly-InOx (InOx:H) channel

〇(DC)Mir Mutakabbir Alom1, Motoki Ando1, Mamoru Furuta1 (1.Kochi Univ. of Tech.)

[19p-A35-10]Closing

〇Takashi Noguchi1, Mamoru Furuta2 (1.Univ. Ryukyus, 2.Kochi Univ. Tech.)