[14a-K306-1~10] 15.7 Crystal characterization, impurities and crystal defects

9:15 AM - 9:30 AM JST(12:15 AM - 12:30 AM UTC)

[14a-K306-2] Development of CH₂F molecular ion implanted silicon epitaxial wafer

〇Ryo Hirose¹, Takeshi Kadono¹, Koji Kobayashi¹, Sho Nagatomo¹, Kazunari Kurita¹ (1.SUMCO CORPORATION)

Keywords:

ion implantation,silicon wafer