Presentation Information

[14a-K401-2]Emission Characteristics of GaN Stripe Structures Fabricated by Hydrogen Atmosphere Anisotropic Thermal Etching (HEATE) Method

〇Seiichi Kataoka1, Akihiko Kikuchi1,2 (1.Sophia Univ., 2.Sophia Semiconductor Research Inst.)

Keywords:

Gallium Nitride,Strain relaxation


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