Presentation Information
[14a-P02-1]Schwarzschild Objective for Interference Microscopy in Soft-X-Ray Region
〇(B)Yuta Fujisawa1, Tetsuya KUREMATSU1, Mitsunori TOYODA1, Masahiko ISHINO2 (1.Tokyo Polytechnic Univ., 2.QST)
Keywords:
Mo/Si multilayer mirror,period length control,Extreme Ultraviolet (EUV)
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