[14p-K403-1~13] 6.2 Carbon-based thin films

4:15 PM - 4:30 PM JST(7:15 AM - 7:30 AM UTC)

[14p-K403-12] Formation of Low-Resistance Layer by High-Concentration B Ion Implantation
into Diamond

〇(M1)Kaiya Imamura¹, Yuhei Seki¹, Yasushi Hoshino¹ (1.Kanagawa Univ.)

Keywords:

ion implantation,Hall effect,Diamond semiconductor