[14p-K403-1~13] 6.2 Carbon-based thin films

3:00 PM - 3:15 PM JST(6:00 AM - 6:15 AM UTC)Presentation by Applicant for JSAP Young Scientists Presentation Award

[14p-K403-8] Formation of nanocrystalline diamond film on thermally nitrided substrate by HF-CVD

〇AOI SHIOKAWA¹, Yuki Miyahara¹, Hirofumi Takikawa¹, Takahiro Hattori², Hiroaki Sugita², Hiroki Gima² (1.Toyohashi Univ. Technol, 2.OSG Co., Ltd)

Keywords:

nanocrystalline diamond film,Hot filament chemical vapor deposition,thermally nitriding

For the processing of Carbon Fiber Reinforced Plastic (CFRP), tools made from WC-Co cemented carbide substrates are coated with Nanocrystalline Diamond (NCD) films. However, the presence of cobalt (Co) binder leads to uneven film growth. We identified carbon filaments as a primary factor and confirmed that high-temperature deposition can mitigate this issue.In this study, we conducted high-temperature NCD deposition using the Hot Filament Chemical Vapor Deposition (HF-CVD) method, along with a gas nitriding pretreatment in the same setup.As a result, nitriding the substrate effectively suppressed the formation of Co particles.