[14p-K503-1~17] CS.3 Code-sharing Session of 6.1 & 13.3 & 13.5

1:00 PM - 1:30 PM JST(4:00 AM - 4:30 AM UTC)

[14p-K503-1] [The 2nd Kenji Natori Award Speech] Crystal structure control of HfO₂-based ferroelectric materials by designing thin films and interfaces using atomic layer deposition

〇Takashi Onaya¹ (1.GSFS, The Univ. of Tokyo)

Keywords:

HfO2-based ferroelectric thin films,atomic layer deposition (ALD)