Presentation Information
[14p-K503-15]Electric field and temperature dependence of wake-up characteristics and physical mechanisms in Hf0.5Zr0.5O2 thin-film ferroelectric capacitors
〇Kosuke Ito1, Mitsuru Takenaka1, Shinichi Takagi1, Kasidit Toprasertpong1 (1.Univ. Tokyo)
Keywords:
ferroelectric,wake-up
HfO2-based ferroelectrics, which are gaining attention as ferroelectric memory materials, face the challenge of the wake-up effect, requiring electric field cycling to induce ferroelectricity, especially in ultra-thin films below 6 nm. In this study, we measured the electric field and temperature dependence of the wake-up characteristics in Hf0.5Zr0.5O2 (HZO) ferroelectric capacitors and discussed the underlying physical mechanisms.
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