Presentation Information
[14p-P03-7]Low damage PEC etching and electrochemical characterization of n-GaN ICP-RIE processed surfaces
〇Takahiro Shimazaki1, Enku Takahashi1, Taketomo Sato1 (1.RCIQE, Hokkaido Univ.)
Keywords:
nitride semiconductor,electrochemical characterization,electro chemical etching
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