[15a-K509-1~6] 13.1 Fundamental properties, surface and interface, and simulations of Si related materials

11:15 AM - 11:30 AM JST(2:15 AM - 2:30 AM UTC)

[15a-K509-6] Analysis of Oxidation Mechanism of Group IV Semiconductor Substrates by Reactive Molecular Dynamics

〇(M2)Kenta Sekiguchi^1,2, Daisuke Ohori², Kazuhiko Endo², Takashi Tokumasu² (1.Graduate School of Eng., Tohoku Univ., 2.Inst. of Fluid Science, Tohoku Univ.)

Keywords:

group IV semiconductor materials,ReaxFF MD,oxidation