[15p-K310-1~9] 15.5 Group IV crystals and alloys

3:15 PM - 3:30 PM JST(6:15 AM - 6:30 AM UTC)

[15p-K310-6] Effect of deposition rate on Si_1−xSn_x epitaxial growth on Si(001) substrate

〇Sosei Ito¹, Shigehisa Shibayama¹, Mitsuo Sakashita¹, Masashi Kurosawa¹, Osamu Nakatsuka^1,2 (1.Grad. Sch. of Eng., Nagoya Univ., 2.IMaSS, Nagoya Univ.)

Keywords:

silicon tin,SiSn,sputtering